Problem B.2 - Manufacture of Immersed, Polarizing Notch Filter

For the first part of this challenge (B.1), the designer will create a three-line, polarizing notch filter at 450 nm, 550 nm, and 650 nm. The design will be immersed in a 45-degree cube with an index of 1.8. Outside of the three high-reflecting notches of s-polarized light, there should be high transmission for s-polarized light in the range of 400 nm to 700 nm. The contrast ratio (𝑇𝑝 /𝑇𝑠 ) will be used for each notch, as well as the ratio of reflected s-polarized light over 99% to the transmitted s-polarized light greater than 99% over the wavelength range of 400 nm to 700 nm every 0.1 nm. The second part of this challenge (B.2) will be the manufacture of the B.1 design using an optical monitor in reflectance at 45-degree incidence, on the actual substrate, with a choice of four bandpass filters. The monitor will only work for one of the four chosen filters for the entire virtual deposition. Unlike problem A where the virtual monitor will run without assistance, the designer will be able to manually manufacture their designs on the evaluation website. The performance criteria from the first part of Problem B will be used to evaluate the fabricated design.

10/16/24: Note that you may attempt to run the optical monitor as many times as you would like for your design. You may choose to submit your design (as an official entry) after any of these. You can also make multiple submissions, but only the MOST RECENT will count.

10/18/24: Deposition speed set to 50A/s.

Design Performance Graph (upload before monitoring)

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Notifications/Errors: none

Eval:none

Optical Monitoring Portion

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